Lub ntsiab Molecules hauv Pre-film Cleaning Agents:

Acids: xws li phosphoric acid, nitric acid, citric acid, thiab lwm yam., dissolve inorganic ntsev nplai, hlau oxides, thiab alkaline nplai, pab tshem tawm cov dej tawv nplai thiab fouling tshuaj los ntawm daim nyias nyias.

Alkalis: xws li sodium hydroxide, poov tshuaj hydroxide, thiab lwm yam, tshem tawm cov organic teeb meem, roj, thiab colloidal hais, thaum kho cov pH ntawm cov tshuaj los txhim kho cov nyhuv tu.

Surfactants: xws li sodium dodecylbenzenesulfonate (LAS), sodium octylsulfonate, thiab lwm yam., txo qhov nro saum npoo, txhawb kev sib cuag ntawm cov tshuaj ntxuav thiab daim nyias nyias, thiab txhim kho kev tu kom zoo.

Chlorinating agents: xws li EDTA (ethylenediaminetetraacetic acid), NTA (nitrilotriacetic acid), thiab lwm yam, complex hlau ions los tiv thaiv hlau fouling, scaling, thiab membrane nto corrosion.

Oxidizing agents: xws li sodium hypochlorite, hydrogen peroxide, thiab lwm yam., oxidize thiab decompose organic teeb meem, pab tshem tawm cov organic paug ntawm daim nyias nyias.